AVS American Vacuum Society 125 Maiden Lane, 15th Floor New

AVS American Vacuum Society 125 Maiden Lane, 15th Floor New

AVS
American Vacuum Society
125 Maiden Lane, 15th Floor
New York, NY 10038
Tel: 212-248-0200
AVS 61 Technical Program
T
he AVS 61st International Symposium
n Biomaterial Interfaces
and Exhibition addresses cutting-edge issues n Electronic Materials & Processing
associated with materials, processing, and
n Magnetic Interfaces & Nanostructures
interfaces in both the research and manufacturing
n Manufacturing Science & Technology
communities.
n MEMS & NEMS
The weeklong Symposium fosters a multidisn Nanometer-scale Science & Technology
ciplinary environment that cuts across traditional
n Plasma Science & Technology
boundaries between disciplines, featuring papers
n Surface Science
from AVS technical divisions, technology groups,
n Thin Film
focus topics on emerging technologies, and more.
Check out the AVS Technical Library for Past Sympo- n Vacuum Technology
sia Virtual Programs and Presentations on Demand. Focus TopicS & Other Sessions
Housing Deadline: October 20
n 2D Materials
Early Registration Deadline: October 20
n Accelerating Materials Discovery for
Complete Details at www.avs.org
Division/Group Programs
n Advanced Surface Engineering
n Applied Surface Science
Invited Speakers
300+ Invited Speakers,
including:
Plenary Speaker:
Tobin J. Marks,
Northwestern University
John Abelson, University of
Illinois at Urbana Champaign
Mark Allen, University of
Pennsylvania
Markus Ammann, Paul Scherrer
Institut
Andre Anders, LBNL
Harry Atwater, CalTech
Rashid Bashir, University of
Illinois at Urbana-Champaign
Bharat Bhushan, Ohio State
Eloisa Bilek, University of Sydney,
Australia
Christian Binek, U Nebraska
Lincoln
Kirill Bolotin, Vanderbilt
University
Etienne Bousser, Ecole
Polytechnique de Montreal,
Canada
Philip Bradford, NCSU
Paul Braun, UIUC
Marcus Brewster, J&J
Hidde Brongersma, Eindhoven
Univ. Technology, London
Richard Caprioli, Vanderbilt
University School of Medicine
Global Competitiveness
Actinides & Rare Earths
n Atom Probe Tomography
n Conservation Studies of Heritage Materials
n Energy Frontiers
n
Francesca Casadio, Art Institute
of Chicago
Andrea Centrone, NIST
Oana Cojocaru-Miredin, MaxPlanck Institut für Eisenforschung
GmbH, Germany
Martyn Davies, The University of
Nottingham, UK
Emilie Despiau-Pujo, CNRS, France
Walt de Heer, Georgia Tech
Nancy Dudney, Oak Ridge
National Lab
Dan Edelstein, IBM
Maria Emelianenko, George
Mason University
Charles Fadley, University of
California, Davis
Mauro Ferrari, President and
CEO, Houston Methodist Research
Institute
Phillip First, Georgia Institute of
Technology
James Fitzpatrick, Salk Institute
for Biological Studies
Elvira Fortunato, Universidade
Nova de Lisboa, Portugal
Fenella France, Library of
Congress
Hongjun Gao, Chinese Academy,
China
Thomas Greber, ETH Zuerich,
Switzerland
Sossina Haile, Caltech
Juergen Henk, University of
Halle-Wittenberg, Germany
Carol Hirschmugl, U Wisconsin
Milwaukee
Naho Itagaki, Kyushu University,
Japan
Diethelm Johannsmann, Technical
University of Clausthal, Germany
David Joy, University of
Tennessee
Ute Kaiser, University of Ulm,
Germany
Tom Kelly, CAMECA Instruments,
Inc.
Norbert Koster, TNO Technical
Sciences, Netherlands
Hans Kreuzer, Dalhousie
University, Canada
Daeyeon Lee, Univ. of
Pennsylvania
Di-Jia Liu, Argonne National Lab
Mengkun Liu, UC San Diego Richard Livengood, Intel
Marko Loncar, Harvard University
Jun Lou, Rice University
Jennifer Mass, Winterthur
Museum
Manos Mavrikakis, University of
Wisconsin-Madison
Michael Moody, University of
Oxford, UK
Dae-Won Moon, KRISS, Korea
Christopher Muratore, University
of Dayton, Ohio
Tina Tse Nga Ng, PARC (Palo Alto
Research Center)
Exhibitor Technology Spotlight
Fundamentals & Biological, Energy &
Environmental Applications of Quartz
Crystal Microbalance
n Helium Ion Microscopy
n In-Situ Spectroscopy & Microscopy
n Materials Characterization in the
Semiconductor Industry
n Novel Trends in Synchrotron &
FEL-Based Analysis
n Scanning Probe Microscopy
n Selective Deposition as an Enabler of
Self-Alignment
n Spectroscopic Ellipsometry
n Surface Modification of Materials by
Plasmas for Medical Purposes
n Tribology
n
n
Aleksandr Noy, Lawrence
Livermore National Laboratory
Shinichi Ogawa, National Institute
of Advanced Industrial Science
and Technology
Adam Olsson, McGill University,
Montreal, Canada
Deirdre Olynick, Molecular
Foundry Matjaz Panjan, Jozef Stefan
Institute, Ljubljana, Slovenia
Gregory Parsons, North Carolina
State University
Lars Pastewka, FraunhoferInstitut
Herbert Pfnur, Leibniz University
Hannover, Germany
Nikolas Podraza, The University
of Toledo
Karthik V. Raman, Indian Institute
of Science Bangalore, India Micheal Ramsey, University of
Graz, Austria
Rasmita Raval, University of
Liverpool,UK
Melissa Reynolds, Colorado State
University
Jose Rodriguez, Brookhaven
National Laboratory
James Rondinelli, Drexel
University
Petra Rudolf, Univ Groningen,
Netherlands
Marcela Sardella: University of
Bari, Italy
Barbara Shollock, Imperial
College, London
Srikanth Singamaneni,
Washington University, St. Louis
Nic Spencer, ETH Zurich,
Switzerland
Andrew J. Steckl, University of
Cincinnati
Franklin Tao, University of Notre
Dame
Veena Tikare, Sandia National Lab
Anne-Marie Valente-Feliciano,
Thomas Jefferson National
Accelerator Facility
Wilfried Vandervorst, Imec,
Leuven
Israel Wachs, Lehigh University
Lynn Walker, Carnegie Mellon U
Charles Wallace, Intel
Zhong Lin Wang, Georgia Tech
Wolfgang Werner, TU Wien,
Austria
Nicholas Winograd, Penn State U
Justin Wiseman, Prosolia Inc.
Robert Wolkow, University of
Alberta, Canada
Wilfried Wurth, Universität
Hamburg, Germany
Xiaodong Xu, University of Washington
Wanli Yang, LBL
Miao Yu, University of Maryland
Stefan Zauscher, Duke University
Haimei Zheng, LBL
Junyong Zhu, USDA Forest Service
Ask the Experts • FREE Coffee Breaks & Lunch • Art Zone Contest • Daily Raffles • Welcome Mixer • Career Center
The Exhibit comprises an extensive display of
tools, equipment, services and consulting for film
deposition, surface and interface measurements
and analysis, materials, chemicals, supplies,
vacuum production and measurement, and related
instrumentation for surface, interface and film
measurements, as well as professional literature
and publications. Exhibits are open Tuesday
morning-Thursday afternoon.
The Career Center/Job Fair provides the
opportunity for job seekers to submit their resumes
and meet with potential employers.
Students, Postdocs, and Early Career Center
Monitoring (QCM-D)-Technology &
Members are are encouraged to attend job and
Applications Tutorial
career forums sponsored by AVS, Intel, and LAM
n Tip Reliability in Atomic Force Microscopy:
Research throughout the week.
The Science of Nanoscale Wear, with
Short Course Training in specific areas of
Applications to Nanometrology & Nanovacuum science & technology will be offered. Other
fabrication Tutorial
Tutorials & Workshops include:
n Federal Funding Town Hall
n Atomic Modeling & the Computational Design of
n Welcome to AVS Workshop
New Materials, Surfaces & Interfaces Tutorial
n Work-Life Balance Workshop
n Design & Analysis of UHV Systems Using the Test
Other Events & Activities:
Particle Montecarlo Code MOLFLOW+ Tutorial
n Topical Conference on Quantitative Surface
n Quartz Crystal Microbalance with Dissipation
Analysis