Levitronix Pumps for Surface Preparation

Transcription

Better Pumps for Better Yields
Levitronix Pumps
for
Surface Preparation
WWW.LEVITRONIX.COM
Who Is Levitronix?
ÎSubsidiary of Pharos
(George Hatsopoulos, Thermo Electron
Alex d‘Arbeloff, Teradyne...)
ÎFounded in 2001, previously part
of Sulzer, a $4B Swiss company
Î13 years experience in MagLev
Technology and Medical Pumps
ÎFirst company with MagLev
Heart Assist Pump on market
Î Pumps for Semiconductor
Industry since 2001
ÎMarket Leader in CMP Slurry Pumps,
Pumps for Single Wafer Cleaning
and Plating
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Levitronix Core Technology
The Bearingless Motor
PM-rotor
Stator
a)
bearing winding
ω
F
iron core
F
Fz
Fz
Fr
Fr
Rotor
ω
drive winding
back-iron
b)
F
Fz
Fr
Fr
Mk
Fz
F
Complete control of a rotor
by magnetic fields!
Protected by 17 Patents!
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Principle of Magnetically Levitated (MagLev)
Centrifugal Pump
Fluid Inlet
Rotor Magnet
Impeller IMP-1
(with encapsulated
Rotor-Magnet)
Impeller
Magnetic
Field
Pump Casing PCA-1
of Pump Head CP-1
Fluid Outlet
Motor
Coils
Motor Stator
Motor BSM-1
(with Motor/Bearing Stator)
No areas of mechanical contact !
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MagLev Pumps for Semiconductor Industry
BPS-1
BPS-3
BPS-4
1.6 bar (23 psi)
2.5 bar (36 psi)
4.5 bar (65 psi)
20 l/min (5 gal/min)
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Main Applications in Semiconductor
# 1 in
# 1 in
# 1 in
Single Wafer Processing
Electrochemical Deposition
CMP Slurry Delivery
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Why Is Levitronix #1
In Single Wafer Surface Preparation?
Advantages of Levitronix Pump
in Spin-Processing Application
¾
Low particle generation
¾ Continuous flow and pressure
(1 pump for 4 nozzles)
¾ Small size
(3-5 times smaller than Bellows pumps)
¾ Electronic control
(Pressure-control or flow-control
without additional hardware)
¾ High reliability
(MTBF of 32 years for BPS-3)
¾The market leader and several
other OEMs have chosen Levitronix
for this application
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Levitronix Pumps
The Reference For Purity
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Trace Metal Contamination by Different Pumps
14
S u rfa c e
B u lk
To ta l
Mass Extracted [μg]
12
10
8
6
4
2
0
Levitronix
BPS-1
Levitronix Levitronix D iaphragm D iaphragm
BPS-3
BPS-4
Pum p A
Pum p B
Data by CT Associates Inc.
P u m p Ty p e
Levitronix pumps add low trace metal contamination
due to small fluid contacting surface !
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Particle Generation of Different Pumps
MagLev Centrifugal Pumps (BPS-1, BPS-3) generate
10-100 times Less Particles compared to Diaphragm Pumps
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Can Filters Solve All Particle
Contamination Problems?
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Retention Efficiency of Different Filters
and Pumps Operated at Different Flow Rates
Overall retention efficiency as a function of pulsation intensity
Bellows: Etchgard
Diaphragm: Etchgard
Centrifugal: Etchgard
Regression: Etchgard
Bellows: Ulti-Etch
Diaphragm: Ulti-Etch
Centrifugal: Ulti-Etch
Regression: Ulti-Etch
1 yr loading - Bellows: Ulti-Etch
1 yr loading - Diaphragm: Ulti-Etch
1 yr loading - Centrifugal: Ulti-Etch
Regression: 1 yr loading - Ulti-Etch
1.0
0.9
LRV of 125 nm Particles
0.8
0.7
0.6
0.5
0.4
0.3
0.2
0.1
0.0
0
10
20
30
40
50
Pulsation Intensity (RSD of Pressure Measurement, %)
Obvious correlation between reduction of retention efficiency and pump pulsation!
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Output Pressure of Different Pumps
(Flow = 10 Gpm)
50
Bellows Pump
Pressure (psig)
40
30
20
10
Bellows pump
0
0.0
0.5
1.0
1.5
2.0
1.5
2.0
1.5
2.0
Time (seconds)
50
Diaphragm Pump
Pressure (psig)
40
30
20
10
Diaphragm pump
0
0.0
0.5
1.0
Time (seconds)
50
40
Pressure (psig)
Magnetically Levitated
Centrifugal Pump
(Levitronix)
30
20
10
Centrifugal pump
0
0.0
0.5
1.0
Time (seconds)
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Filter Retention with Low Particle Loading
(After 0.1 Years of Polydisperse PSL Loading)
LRV = Log (cu/cd)
90% Retention
70% Retention
A 0.1 μm filter operated with a highly pulsating pump retains 3 times
less particles > 0.1 μm compared to the same filter operated with a
non-pulsating pump!
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Filter Retention with High Particle Loading
(After 1 Year of Polydisperse PSL Loading )
10
LRV
LRV = Log (cu/cd)
1
60% Retention
20% Retention
Bellows
Diaphragm
Centrifugal (large)
Centrifugal (medium)
0.1
0.1
0.2
0.3
0.4
0.5
Particle Diameter (μm)
After 1 year of simulated particle loading, the 0.1 μm filter operated
with the diaphragm pump retained only 20% of 0.1 μm particles!
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Integrated Electronic Control
&
System Monitoring
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Flow Control With Levitronix Pump
Flow
Meter
Levitronix
Pump
Flow range with BPS-1
0.5 mL/min to 10 L/min!
Pump
Controller
System Control
- Set Flow
- Actual Flow
- ON/OFF
!
W arning Signals
- Flow Alarm (Low Flow -> Line Clogged)
- Trend Warning (Dynamic Condition Trending)
Example of achievable accuracy: Flow Range 50 – 4000 mL/min
¾Repeatability in-between 50-4000 mL/min:
± 0.5%
¾Absolute accuracy (after fluid calibration)
± 1%
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On-Line Blending of Chemicals
with Levitronix Pumps
DI-W ater
C h em ica l 1 (i.e . N H 4 O H )
Flow
M eter
Flow
M e te r
Levitronix
Pump 1
Levitronix
Pump 3
serves also
as Mixer!
Main Flow
P um p
C o ntroller 2
P um p
C o n tro lle r 1
C h em ica l 2 (i.e . H 2 O 2 )
Flow
M e te r
Levitronix
Pump 2
S ys tem C o ntro l
- Flow settin g
- S tart/S top
Pump
C on trolle r 2
W arning S ignals
- O ut of flow range
- System W arnings
!
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Multi Channel Flow Control with Single Pump
Thin line
(flow resist)
Chamber X
Thin line
(flow resist)
Reference
flow
(optional)
Drain
Chamber 1
Flow
S ensor
Bypass
(optional)
Thick line
(no pressure drop)
Chamber 2
Tank
Filter
Levitronix
Pump
All Control Functions
Realized with
Pump Controller
No Additional
Hardware Required!
Pressure
Sensor
Controlled pressure at
main distribution point
Pump
Controller
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Booster Pump with Electronic Pressure Control
Constant Pressure
(+- 0.5 PSI)
Variable Pressure
From Slurry Loop
Flow
Controller
Pressure Control Loop
Pressure
Transducer
Levitronix
Pump
Booster
Pump
Built In Control Function!
No additional Hardware
is necessary!
Flow
Controller
Flow
Controller
Filter
(option)
Pump
Controller
!
System Control
Warning Signal
- Filter Monitoring
- Condition Monitoring
- Stability of Fluid Properties
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Dynamic Condition Trending (DCT)
(Filter Monitoring…)
Speed
(rpm)
6000
Max Speed Limit
5000
Trending Band
Speed Warning Limit
Trend Warning
4000
3000
Flow
Alarm
2000
1000
0
0
2
4
6
Time (days)
You don‘t have to wait until it‘s too late!
8
10
12
Advance
Warning
Time
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Levitronix Pumps
Smallest Size vs. Performance
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Size Comparison BPS-4 with Iwaki FW-80
252
231
244
600
195
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Size Comparison BPS-4 with YD-40TTD
525
231
244
424
195
447
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Performance Comparison BPS-4 with Iwaki FW80
45
LEV750 BPS-4
Levitronix
40
8000 RPM
FW8OT1
0.5Mpa
30
7000 RPM
20
6000
10
5000 RPM
m
10
L/min
20
30
40
50
60
70
80
90
100
110
120
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Performance Comparison BPS-4 with YD-40TTD
45
LEV750
Levitronix
BPS-4
性能比較
40
8000 RPM
YD-40TTD
0.5Mpa
30
7000 RPM
20
6000 RPM
10
5000 RPM
m
10
L/min
20
30
40
50
60
70
80
90
100
110
120
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Operating Cost
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Comparison of Maintenance Cost
Manufacturer & Pump Type
Annualized
Maintenance Cost
ASTI PFS-3
$1436*
Trebor Maxim 50D
$1193*
Trebor Magnum 960
$964*
White Knight AT 100
$1605*
Yamada DP-20F
$1720*
Yamada DP-25F
$2107*
Average Air Operated Pump
$1504*
Levitronix BPS-3
$395**
Levitronix BPS-4
$545**
Average Levitronix Pump
$470**
* Spare Parts + 3h work at $80 per hour divided by maintenance interval time
** Impeller + ½ h work every two years
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Efficiency of Centrifugal Pumps vs.
Pneumatic Pumps
Î Based on Thermodynamic principles and performance data
AIR-DRIVEN PUMP
(UNITS OF OUTPUT POWER)
Electrical Power
100
CENTRIFUGAL PUMP
(UNITS OF OUTPUT POWER)
Electrical Power
Electric Motor
92
Compressor
78
15% Compressor Losses
Air Dryer
66
15% Thermodynamic Losses
100
8% Motor Losses
Electric Motor
82
Centrifugal
Pump
32
18% Motor Losses
61% Hydraulic Losses (case BPS-4)
Air Distribution
30% Pipe Losses (pressure drop, leaks)
46
Network
Air-Driven
6
88% Pump Losses (hydraulic, piston, valves,…)
Pump
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Pump Energy Cost Comparison
Energy cost per year assuming electricity cost of 6ct/kWh
Operating condition 30PSI, 10 Gpm
Operating condition 45PSI, 20Gpm
Î Levitronix Pumps are more cost effective than air-driven pumps
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Can you still afford a pneumatic pump
with rising energy prices?
Stop Your Pump From Stealing Your Profits!
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Levitronix Pumps for Surface Preparation

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