Mass Spectrometers for Residual Gas Analysis

Transcription

Mass Spectrometers for Residual Gas
Analysis - RGA
For Applications in a Vacuum Environment
www.HidenAnalytical.com
Quadrupole Mass Spectrometers for Advanced Science
Quadrupole Mass Spectrometers
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Mass range options to 2500 amu
Single and Triple filter options
6, 9 or 12 mm diameter rods
Networking interface
Ioniser options including
Cross beam and Platinum
Applications Include:
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RGA
Gas Analysis
Plasma Characterisation
UHV Surface Science
SIMS
RGA Overview
The Hiden Quadrupole Mass Spectrometer for Residual Gas Analysis is suitable for
vacuum print analysis, leak detection and trend analysis.
Features include:
• High sensitivity helium leak detection, mass selectable for alternative search gases
• Advanced analysis capability for complex gas interpretation
• Data presentation as mass peak ratios for highest stability and accuracy
• Twin burnout-resistant oxide coated iridium filaments
• User-programmable multi-tasking firmware for creation of process-specific control and
data acquisition functions
• Industry best 3-year warranty and lifetime service support
RGA Applications
The Hiden Residual Gas Analyser can be used for a wide variety of applications, including:
• Vacuum Diagnostics
• Leak detection
• Contamination analysis
• Semiconductor production
• Vacuum process analysis
• Reactive sputtering closed loop control
• Vacuum furnace monitoring
• Molecular beam studies
• UHV/XHV surface science
• UHV TPD
Specification Levels
HALO: Single filter mass spectrometer for multi-purpose HV/UHV applications
3F: Triple filter mass spectrometer for precise analytical capability
3F-PIC: Triple filter mass spectrometer with pulse ion counting detector for fast
event studies
Hiden RGA-HALO Features
• Interchangeable gauge heads and control modules reduce operational and aftersales
support costs.
• Mass range options 100, 200 and 300 amu.
• Dual Faraday / Electron Multiplier
detector with partial pressure range
10-4 mbar to 10-13 mbar.
• DN-35-CF (2¾"/70mm O.D. Conflat-type).
• Insertion length: 204mm
• RF Head Dimensions: Height –
117mm, Width - 104mm, Depth
- 195mm.
• Fast speed – up to 500 measurements
per second (but through 1 decade only).
Electron Multiplier Detector
Triple Filter Mass Spectrometer
Why have a triple filter?
Two main advantages:
1. Strict control over the quadrupole entrance and exit fields
provides enhanced sensitivity for high mass transmission and
increased abundance sensitivity
2. Enhanced long-term stability. The bulk of the deselected ions
from the quadrupole ioniser deposit harmlessly on the RF-only
pre-filter stage, minimising contamination on the mass
selective primary filter.
Triple Filter – Enhanced Resolution
• For applications where you wish to measure a low intensity peak
next to a high intensity peak.
Triple Filter – Enhanced Sensitivity
• Triple filter system will also give an increase in sensitivity with
increasing mass.
Hiden RGA-HAL 3F Features
support costs.
• Mass range options 100, 200, 300 and 500 amu.
• Dual Faraday / Electron Multiplier
detector with partial pressure
range 10-4 mbar to 10-14 mbar.
• DN-63-CF (4½"/114mm O.D. Conflat-type).
- 216mm.
• Fast speed – up to 500 measurements
per second (but through 1 decade only).
Pulse Ion Counting (PIC) Detector
• 7 decade continuous dynamic range.
• 24 bit counter for 1c /s resolution.
• Faraday Cup option for higher pressure
measurements.
• Signal gating with 1 s resolution energy
& mass distributions vs time.
• Data export options.
Hiden RGA-HAL 3F PIC Features
support costs.
• Mass range options 100, 200, 300 and 500 amu.
• Typically PIC detector only
(Faraday detector is an option)
PIC with partial pressure range
5x10-6 mbar to 5x10-15 mbar.
• DN-63-CF (4½"/114mm O.D. Conflat-type).
- 216mm.
• Fast speed – up to 500 measurement
per second (through 7 decades).
Application Specific Performance
• Fast pulse ion counting detector with continuous 7 decade
measurement from 1 cs-1 to 107 cs-1
• Minimum detectable partial pressure 5 x 10-15 mbar
Hiden RGA Configuration Options
Product Title
Mass range
(amu)
Detector
Maximum
Operating Pressure
Minimum
Detectable Partial
Pressure
Application
HALO 100
100
Faraday
1 x 10-4 mbar
1 x 10-11 mbar
RGA
HALO 201
200, 300
Channelplate
1 x 10-4 mbar
2 x 10-13 mbar
RGA
HAL 200
200
Faraday
1 x 10-4 mbar
5 x 10-12 mbar
RGA
HAL 201
100, 200,
300
Channeltron
1 x 10-4 mbar
2 x 10-14 mbar
RGA
HAL 3F RC
50, 200,
300, 500
Channeltron
1 x 10-4 mbar
2 x 10-14 mbar
RGA
HAL 3F PIC
50, 200,
300, 500
Pulse Ion
Counter
5 x 10-6 mbar
(1 x 10-4 mbar with
Faraday)
5 x 10-15 mbar
UHV-TPD
HAL 1001-9
RC (9mm)
50, 300,
500, 1000
Channeltron
1 x 10-4 mbar
2 x 10-14 mbar
High mass or
high resolution
HMT 100
100
Faraday
5 x 10-3 mbar
2 x 10-11 mbar
RGA
HMT 101
100
Channelplate
5 x 10-3 mbar
2 x 10-13 mbar
RGA
Ion Source Options
• Standard RGA – A radially symmetric configuration for general applications.
• UHV Low Profile – Optimised for UHV TPD studies enabling closer proximity of the ion
source to the evolution surface.
• Closed Source – For high pressure studies with direct gas input used in conjunction with a
differential pumping stage for the analyser.
• Platinum Ion Source - Configured for improved operation in reactive atmospheres.
• Gold Plated Ion Source - Configured to minimise the effects of source outgassing.
• Basic Cross Beam Source.
• XBS Cross Beam Source – Configured specially
for MBE deposition rate monitoring and control.
• Laser Cross Beam Source.
• 4 Lens Ion Optics with Integral Ioniser
Ion Source Options – PIC specific
UHV compatible mass filter shrouds
UHV Low Profile – Optimised for UHV TPD studies enabling
closer proximity of the ion source to the evolution surface.
HAL 3F-PIC and quartz shroud
Range of Shrouds
Special Hiden RGA Configurations
HMT – High Pressure RGA
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HMT mode for high pressure operation to 4x10-3 mbar
RGA mode for high sensitivity operation to 10-13 mbar
Stability better than ±1% over 24 hours
Fast access mixed mode scanning
Real time background subtraction
100 amu
RGA For UHV: HAL 201 RC
• Minimum detectable partial pressure of 5 x 10-14 mbar
• Gold plated ion sources to minimise source outgassing
• EPICS is the standard instrument control software and Hiden HAL system is fully
compatible with EPICS software driver.
• Based on the RGA supplied to the Brookhaven National Laboratory in the USA (for
which we have now supplied over 70 of these types of RGA system).
• Suitable for use with:
- Tokamaks/Torus Facilites
- Beam Lines
- Particle Accelerators
- Synchrotrons
- UHV Chambers
RGA for MBE: HALO 201 MBE
• Constructed from compatible materials and designed for prolonged use in MBE
environments.
• Includes molybdenum wiring in place of copper and a contamination resistant ion
source shroud.
• Applications include semiconductors, solar cells, oxides, etc.
• Also the option of a thermal extender for RGA operation during bakeout
qRGA for Advanced Research
• For Tokamak/Torus Fusion Research Facilities
• Threshold Ionisation Mass Spectrometry allows close mass peak separation
• Low cost multi unit solution with radiation and magnetic shielding solutions
qRGA, real time TIMS data taken at JET, UK.
D2 and 4He are easily separated and
quantifiable
qRGA, real time TIMS data taken at JET, UK.
Spectra shows scans at 3amu, separating
3He from HD. Mass separation: 0.0058 amu
XBS Deposition Rate Monitor
A quadrupole mass spectrometer designed for monitoring multiple
sources simultaneously. Suitable for:
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Monitor and control in MBE processes
Molecular beam studies
Multiple beam source analysis
Photoionisation studies
Desorption/outgassing studies
Monitor and diagnostics of contaminants in the process chamber
It also doubles as a high performance RGA with high-sensitivity
helium leak check mode for vacuum quality verification.
User configurable
beam aperture plate
Water cooled
for thermal
protection
With z-shift drive for insertion/extraction
Integral Ion Source:
Hiden 3F series
quadrupole mass
spectrometer
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Shroud to inhibit
contamination
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No direct beam
contact with
internal probe
structures
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320 or 500 amu mass range
Dual Faraday or Channeltron Electron Multiplier ion detector
10-4 to 2.5x10-14 mbar partial pressure range
Typical growth rate determination of <0.01 Å s-1
Beam acceptance apertures are configured for each
specific process chamber source position made as replaceable plug-in
elements.
XBS Probe Tip + Beam Apertures
3F Series 1000/2000 RGA
• Multiple ion source options
• Configured with 6mm, 9mm or 12mm pole diameters
What pole diameter do I need?
• Total RF output power is fixed for a given generator
• Power demand increases dramatically with increasing RF frequency (∝ ν5)
• For given mass, performance improves with increasing frequency
• For given tolerances, transmission and mass separation improve with
increasing pole diameter
50/300/510 amu
• Overall size and cost increase with increasing pole diameter
50/300/510/1000 amu
• Enlarging pole diameter increases assembly
capacitance and limits RF range (increases
300/510/1000 amu
power losses)
6mm
9mm
12mm
• Designed for gas analysis in high precision
scientific and process applications.
• Pre and post filter in combination with longer
mass filter and wider rod diameter of 9mm or 12
mm results in increased:
• mass resolution
• ion sensitivity
• stability for precision/ratio measurements
• high mass transmission
• Available with SEM or PIC detector or dual
Faraday/SEM or Faraday/PIC models
“Over two years the position of the flat peak measurement did not move significantly”
“The stability of the Hiden QMS compares favourably”
High stability for precision isotope ratio measurement: 40Ar/39Ar
geochronology research. Data taken by B Schneider et al.[1]
Hiden RGA Users
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Los Alamos National Lab
Samsung
NASA
Intel Corporation, USA
CERN
Carl Zeiss, Germany
California Institute of Technology
Brookhaven National Laboratory
Corning
CCFE (JET)
Durham University
National Physical Laboratory
Jozef Stephan Institut
Max Planck Institut
Bern University
Rutherford Appleton Laboratory
SLAC National Accelerator Laboratory
University of Sao Paulo
Aarhus University
MASsoft Professional control software
• Template driven quick start operation
• Real time data display
• Mixed mode scanning including trend
analysis
• Statistical analysis and peak integration
• Integrated mass spectral library
TPDsoft
Allows control of temperature ramp profiles and data acquisition
simultaneously for UHV TPD applications.
3D bar data view in TPDsoft
MS response vs. temperature
EPIC and IDP
The Hiden EPIC and IDP have all features of high performance RGAs but with extra
features making them outstanding research grade mass spectrometers.
The Hiden EPIC and IDP can be used for applications beyond the standard RGA
including:
• UHV surface science
• Electron stimulated
desorption
• Photon stimulated
desorption
• Thermal desorption studies
• Radical analysis
• Energy and biofuels
• Time resolved studies
EPIC - Features
• Pole bias mid-axis potential
• Negative ion capability
• Factory upgradable for inclusion of an energy filter ensuring
compatibility with the Hiden plasma/SIMS systems
• Suitable for Electron Attachment Mass Spectrometry
IDP - Features
• For direct analysis of low energy ions and neutrals from UHV surface
science techniques
• 4 lens ion optics focusses beam to allow low energy beam analysis
Hiden IMP EPD
The Hiden IMP EPD is used for the precise end point detection in the
ion beam etch step of the fabrication of thin film devices.
The Hiden IMP is a differentially pumped, ruggedized secondary ion mass spectrometer for
the analysis of secondary ions and neutrals from the ion beam etch process
The IMP EPD
system comprises:
• Stainless Steel Shroud with Sampling
Orifice
IMP-EPD
• Ion Optics with Energy Analyser and
integral ioniser
• Triple filter Quadrupole mass analyser
• Pulse Ion Counting Detector
• Differentially Pumped Manifold With
Mounting Flange to Process Chamber
• Data System with integration to the
process tool
Hiden IMP EPD Data – Example 1
Ta / NiFe /Ta
14000
13000
12000
Tantulum
11000
10000
SEM : c/s
9000
8000
7000
6000
5000
4000
3000
Nickel
2000
1000
0
00:00
03:20
06:40
10:00
13:20
16:40
20:00
Time MM:SS
The IMP EPD data shows the depth resolution achieved in an ion mill of a: tantalum / nickel
iron / tantalum stack where the tantalum layers are 30Å.
Hiden IMP EPD Data – Example 2
The data shows
the consistency of analysis in
production.
4 Wafers are run
sequentially:
Tantalum, Nickel and Silicon
are monitored.
The third wafer has an
imperfection in the recorded
silicon signal.
IMP EPD Summary
• IMP – EPD for end point detection in ion beam etch
processes:
• End Point resolution; +/- 5 Angstroms
• Sensitivity sufficient to work with 99.9% masked
wafers
• Sensitivity sufficient to work with small samples from
6mm2 to large scale.
• Process control for production
• Adaptable to large and small ion beam etch
chambers
• Operates as a residual gas analyser, RGA
Vacuum Process Control and Diagnostics
• Partial pressure measurement and control of process gases through the
process pressure range 5 mbar to 10-4 mbar (HPR-30 process gas analyser)
• Reactive sputter process control (HPR-30 Process gas analyser)
• Vacuum diagnostics (HPR-30 process and RGA gas analyser)
• Vacuum coating process monitoring (HPR-30 system)
UHV Surface Science
• RGAs (3F PIC, HMT, HAL for UHV, HALO 201 for MBE)
• UHV TPD (TPD Workstation)
• End point detection for ion beam etch (Ion Milling Probes)
Atmospheric Gas Analysis Systems
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Bench, cart or console mounted configurations
Wide range of application specific gas inlets
Corrosive gas and oil free pumping options
Modular construction
Detection to PPB levels
Applications Include:
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Catalysis
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High Purity Gas Analysis
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TA-MS
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Fermentation
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Environmental Monitoring
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Plasma Diagnostic Probes
Mass and energy analysis of ions, radicals and neutrals
Gating input for pulse plasma applications
Positive and negative ion capability
2500 amu quadrupole option for polymer and cluster
studies
• Suited to etching and deposition applications
2500 amu EQP with z drive
EQP System
Plasma Diagnostic Probes
RF compensated Langmuir Probe with z-drive
Automated analysis with real time trend display of
key plasma parameters including:
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Ion density
Plasma Potential
Electron Energy
Debye Length
SIMS – Bolt-on Components
• Bolt-on components for high performance dynamic and static
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SIMS analysis
High transmission ion optics and energy analyser
Integral ion gun raster control with signal gating for depth
profiling
Integral front end ioniser for RGA and SNMS
SIMS Imaging Software Option
SIMS Workstation
• Rugged general purpose SIMS analysis station
• The series of SIMS workstations are modular and upgradeable
(Foundation, Standard and Plus)
• Rapid turnaround of all types of sample
• Integral ion gun raster control with signal gating for depth profiling
• Static, dynamic and imaging SIMS
• Integral front end ionizer for RGA
and SNMS
Hiden Analytical Ltd.
420 Europa Boulevard
Warrington, WA5 7UN, England
[email protected]
Tel: +44 (0)1925 445 225

Mass Spectrometers for Residual Gas Analysis

Transcription

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