SVG‐4A100 SVG  Optronics    Multi‐Axis Laser Direct Writing System The Ultimate R&D Laser Pattern Generator

 The Ultimate R&D Laser Pattern Generator
MicroLab : A powerful Micro-Structure Fabrication Lab
Multi‐Axis Laser Direct Writing System
SVG‐4A100
SVG Optronics Introduction The MicroLab, SVG-4A100, a novel model of laser pattern generator or direct writing system with
SLM(spatial light modulator) technology is designed to fabricate the precision patterns on the planar
substrates and curved surfaces under the rectangular or polar coordinates. The minimum spot can be
achieved to less than sub-wavelength to exposure step levels with binary phase structures for
beam-shaper and micro-structure devices.
Features SLM is the basis of a new photomask pattern
generation technology that is fundamentally different from
current production technologies. SLM technology unites
laser productivity with e-beam´s high-resolution, creating a
powerful photomask pattern generator with the potential to
extend through many generations of technology.
The almost outdated Pattern Generators use a system
of raster scan technology, which are common today. These
systems use a focused laser beam to write arbitrary
microstructures with minimum features sizes down to 600
nm on almost any material. For structures smaller than 600
nm the latest method is the SLM technology offering a very
high resolution, quality and throughput.
Another method is E-Beam writing, but at the cost of a
very slow write speed and a high cost of ownership. The stage with the mask blank moves continuously
and the interferometer commands the laser to flash when it reaches the position for the next field.
Because of the short flash time, the movement of the stage is frozen and a sharp image of the SLM is
produced in the resist. The SLM is reloaded with a new pattern in time for the next flash. The pattern are
stitched together from the fields. To write high quality microstructures down to 280 nm in a short time, a
Maskless Laser Lithography System with SLM technology is most likely the right choice. It eliminates the
turnaround time needed for the mask making process
and makes it quick and easy to adjust a prototype
design.
The MicroLab is suitable to be used stand along
under the rectangular or polar coordinates and has the
benifit to shoot the high resolution patterns with time and
cost-effective compared with e-beam lithography, by
using UV laser and large NA objective. The MicroLab is
suitable to fabricate the micro-optical devices,
masks,CGH's, beam shapers, diffractive or refractive
lens and lens array. The MicroLab has four axis
controlling parameters (x-y-z-theta) to support for writing
the patterns on the concave or convex surfaces with
automatic focusing system.
维格光电 SVG Optronics, Co., Ltd. 478 Zhongnan Street, SIP, Suzhou 215026, China 2
Software MicroLab supports multiple exposure modes, such as grayscale lithography, vector writing, raster scanning and Flash tile beam lithography, leads to achieve unbelievable micro‐structures. Specifications Write mode (NA) 0.95 0.85 0.40 0.25 0.10 Address Grid (nm) 20 40 60 80 100 Feature size (μm) 0.30 0.40 1.0 2.0 4.0 Write Speed(mm2/min) 3 10 30 100 200 Edge Roughness (3s, nm) 40 50 70 70 280 CD Uniform (3s, nm) 50 60 80 80 300 Alignment accuracy (3s, nm) 100 120 150 200 400 Contact us SVG Optronics，Co. 478 Zhongnan Street, SIP, Suzhou 215026, China www.SVGoptronics.com Tel：86‐512‐62589170 Fax：86‐512‐62520928 [email protected] 维格光电 SVG Optronics, Co., Ltd. 478 Zhongnan Street, SIP, Suzhou 215026, China 3
Parameters format resolution Feature size XY scanning speed XY resolution XY repeat positioning CCD alignment CCD autofocusing Rotating speed Rotating accuracy Data format wavelength SLM Laser power size(L/W/H) weight Specifications 100mm×100mm (optional) 200nm 0.28 ~ 1um（#50），1 ~ 5um（#20），5 ~ 20um(#10) 25 mm/s 20nm 100nm 0.5um 0.3um 150°/s 0.001°/s DXF , GDSII , Gerber, ARR, BMP 405nm, or 351nm DMD1024 x 768 @10.8um 40mW ~ 100Mw, blue laser or UV laser 780mm×360mm×720mm ~150kg Examples and Applications Micro­Optical Devices Fresnel and vector patterns Grating and Dot‐array 维格光电 SVG Optronics, Co., Ltd. 478 Zhongnan Street, SIP, Suzhou 215026, China 4
Micro‐lens and curve inspection Security images Optical Variable Devices 3D holograms Hexagonal and micro‐texts Micro mold Fabrication e‐paper micro‐cup 维格光电 SVG Optronics, Co., Ltd. 478 Zhongnan Street, SIP, Suzhou 215026, China 5
Bio‐chips and Fluids Micro‐structure materials Cylindrical array Micro‐chips RF Antenna RF MEMS Switch 维格光电 SVG Optronics, Co., Ltd. 478 Zhongnan Street, SIP, Suzhou 215026, China 6