generating waveforms - PE²

generating waveforms
May 20 – 22, 2014
Warsaw / Zielonka, Poland
Please register:
www.plasma-conference.huettinger.com/en.html
Questions? Please contact us:
Ms. Marta Gryciuk
Phone +48 22 76138-16
[email protected]
WorkShop, May 20 (345 € per person)
08:30 - 09:00 TruPlasma Highpulse New
Prof. A. Ehiasarian, SHU, UK
P. Różański
TRUMPF Huettinger Sp. z o.o., PL
09:00 - 09:45 Practical demonstration
09:45 - 10:00 Coffee break
10:00 - 10:30 Bipolar A control /
selection of the arc management
New features – New control platform
Dr. M. Żelechowski
TRUMPF Huettinger Sp. z o.o., PL
10:30 - 11:15 Practical demonstration
11:15 - 11:30 Coffee break
11:30 - 12:00 Bipolar B new functions
(working with vacuum chamber)
K. Ruda
TRUMPF Huettinger Sp. z o.o., PL
12:00 - 12:45 Practical demonstration
12:45 - 13:30 Lunch break
13:30 - 14:00 Matchbox
(working with vacuum chamber)
W. Glazek
TRUMPF Huettinger Sp. z o.o., PL
K. Kompa, KOMPA Sp. z o.o., PL
14:00 - 14:45 Practical demonstration
14:45 - 15:00 Coffee break
15:00 - 15:30 Advantages of cable length
autonomy
A. Grede
TRUMPF Hüttinger GmbH + Co. KG, DE
15:30 - 16:15 Practical demonstration
16:15 - 16:30 Coffee break
16:30 - 17:00 Frequency tuning and interaction
with matchbox: practical application
Dr. C. Bock
TRUMPF Hüttinger GmbH + Co. KG, DE
17:00 - 17:45 Practical demonstration
17:45 - 18:00 End of workshops
generating
waveforms
Conference Day 1, May 21 (free of charge)
08:00 - 08:30 Conference Registration
08:30 - 08:40 Welcome speech
Dr. R. Bugyi
TRUMPF Huettinger Sp. z o.o., PL
08:40 - 09:00 Recirculating current in high-power
impulse magnetron sputtering
Dr. D. Ruzic
University of Illinois, US
*
09:05 - 09:25 High-power impulse magnetron
sputtering (HIPIMS) applications
Prof. A. Ehiasarian
Sheffield Hallam University, UK
*
09:30 - 09:50 HIPIMS deposition of optical
coatings: Lessons learned
Prof. J.E. Klemberg-Sapieha
Ecole Polytechnique de Montreal, CA
*
09:55 - 10:15 Flexibility of transparent conductive
oxide and SiOx permeation barrier
oxide multilayers on polymers
S. Han-kyu
Reno-Fec Co. Ltd., KR
*
10:20 - 10:40 Coffee break
10:40 - 11:00 PIC-MC simulation of magnetron
discharges: Ion energy distribution
and 3D effects
Dr. A. Pflug
Fraunhofer-Institut Braunschweig, DE
*
11:05 - 11:35 Frequency tuning and new
approach to impedance matching
in RF applications
W. Glazek
TRUMPF Huettinger Sp. z o.o., PL
Dr. C. Bock
TRUMPF Hüttinger GmbH + Co. KG, DE
*
11:40 - 12:00 Waveform generation in microwave plasmas: Advanced power
systems and industrial applications
J. Schneider
Muegge GmbH, DE
*
12:05 - 13:10 Lunch break
13:10 - 13:30 Corrosion of low-e coatings based
on silver
Dr. A. Georg
FHG ISE, DE
*
13:35 - 13:55 Application of high-density plasma
nitriding technique by hollow
cathode discharge
J. Yoo
J&L TECH CO., LTD, KR
*
14:00 - 14:20 Advanced solutions in bipolar
power supply for different systems
and materials
K. Ruda
TRUMPF Huettinger Sp. z o.o., PL
*
14:25 - 14:45 Industrial coating production with
pulsed plasmas
R. Tietema
Hauzer Technocoating, NL
*
14:50 - 15:20 Get Together: Time2Network
15:20 - 15:40 Different process parameters
controlling reactive high-power
impulse magnetron sputtering of
dielectric oxide films
Dr. J. Rezek
University of West Bohemia, CZ
*
15:45 - 16:05 High-power helicon discharge
as plasma cell for future plasma
wakefield accelerators
Dr. B. Buttenschön
MPI for Plasma Physics, DE
*
16:10 - 16:30 Upgrade packages for MF power
supplies
U. Ambrosy
TRUMPF Hüttinger GmbH + Co. KG, DE
*
16:40 - 17:10 Conclusion 1st day
17:10
Transfer to hotel
18:00
Transfer to company
18:15
Company tour
19:00
Champagne reception
and evening event
Conference Day 2, May 22 (free of charge)
09:00 - 09:10 Welcome / start of the conference
09:10 - 09:30 Review on pulse power
development
Prof. Dr. B. Szyszka
Institute of Technology, Chair Technology of Thin Film Devices, DE
*
09:35 - 09:55 Benefits of the controlled reactive
high-power impulse magnetron
sputtering of oxide and oxynitride
films
Prof. J. Vlcek
University of West Bohemia, CZ
*
10:00 - 10:20 High performance linear and large
area inductively coupled plasma
source for high rate deposition
and etching of thin films, ashing
of photo resist, abatement of
hazardous gases and sterilization
of medical equipment
D. Stevenson, E. Shunko
Wintek Electro-Optics Corporation, US
*
10:25 - 10:45 Medium frequency technology
for ICP – based processes in SEMI
applications
M. Golan
TRUMPF Huettinger Sp. z o.o., PL
*
10:50 - 11:00 Coffee break
11:00 - 11:20 A new family of roll to roll
sputter web coaters designed for
TCO and low emissivity coatings
G. Mahnke
SCHMID Vacuum Technology GmbH, DE
*
11:25 - 11:45 RF heating of food products
T. Pfeiffer
Fraunhofer Institute for Process
Engineering and Packaging IVV,
Freising, DE
*
11:50 - 12:10 RF + DC power applied to rotary
ITO cathodes
Russ Lovro, SCI, US
*
12:15 - 12:35 Superposition of mid-frequency
and high-power impulse
magnetron sputtering
H. Gerdes
Fraunhofer Institute for Surface
Engineering and Thin Films IST, DE
*
12:40 - 13:30 Lunch break
13:30 - 13:50 Self-organization in high-power
impulse magnetron plasmas and
consequences for ion energy
distribution functions
Dr. A. Anders
Lawrence Berkeley National
Laboratory, US
*
13:55 - 14:15 Industrial implementation of
reactive magnetron sputtering
processes
V. Bellido-Gonzales
GENCOA Ltd., UK
*
14:20 - 14:40 Innovative approach to
the design and production
of new functional hard coatings
with low friction and corrosion
protection
J.H. Sun
Korea Institute of Industrial
Technology, KR
*
14:45 - 15:05 New deposited metallic coatings
for textile applications
Prof. Ph.D. Ju-Liang He
FENG CHIA University, TW
*
15:10 - 15:30 Linear Coaxial Microwave
Technologie
M. W. Stowell
Applied Materials Inc., Santa Monica,
US
*
15:35 - 16:00 Final discussion
~ 16:00 Official end of the conference
In addition, you have the option to extend your participation by one day. This option provides an opportunity
to strengthen the knowledge acquired during the event
by hands-on working with the vacuum chamber as well
as testing a variety of vacuum chamber coatings made
by generators with different waveforms.
Please contact us for reserving time for you.
* 5 mins discussion
5th Power Electronics for Plasma Engineering Conference (PE²)
Exchange and collaboration have always been an integral part of R&D, be it about latest product and application trends or roadmap strategies. As technological changes continue to accelerate, they have become necessary factors which define the pace of industrial research and
development.
Join us for an interesting exchange and discussion about development methods and manufacturing flexibility. Learn how innovation can give you a competitive edge. And, see our latest
developments in DC, MF and RF plasma power supplies for the production of large area coating.
We look forward to seeing you soon in Poland!
Conference and workshop venue
TRUMPF Huettinger Sp. z o.o.
Marecka 47
05-220 Zielonka, Poland
We have secured a block of hotel rooms for this event:
n Hotel U Pietrzaków, www.upietrzakow.pl
n Hotel Trylogia, www.hoteltrylogia.pl
n Hotel Mistral, www.hotelmistral.pl
Conference language: English
Subject to change without notice. See current issue at:
www.plasma-conference.huettinger.com/en.html
Issue: May 2014
TRUMPF Huettinger Sp. z o.o.
Marecka 47 · 05-220 Zielonka · Poland
Phone: +48 22 76138-16
[email protected]
www.trumpf-huettinger.com