epiphot300/200 - Taylor Hobson Brasil

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Inverted Metallurgical Microscopes
EPIPHOT300/200
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TheEPIPHOT
200:
Comparable
Powerina SmallerPackage
The wellequipped,affordableEPIPHOT200 has
many of the outstanding features of the EPIPHOT
300, in a more compact and upgradablepackage. It
is the instrument of choice for those of Vouwhose
primary focus is observation and projecting the
results on to a TV monitor.
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Photomicrographiccapability is but one of the many
options availablefor this versatile instrumento
G
CFInfinityCorrected,
OpticalSystem
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An ideal optical system which
combines Nikon's renowned CF
Optics with Infinity Corrected
design for even greater system flexibility. The result is
sharp and clear images you can depend on.
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ReticleImprinting
[Option]
Because the reticle is inserted
at the primary image plane
.. position, the micrometer
maintains fine focus without being affected by the state
of the sample surface being observado Austenite
reticles and grids can algo be imprinted.
-
Operator-friendly
Design
A lowered stage design (75mm/
2.9 in. lower than the previous
model) and contrais conveniently located within
easy reach greatly facilitate overall operation, as
11 does the built-in interlocking aperture diaphragm which automatically adjusts
during darkfield/brightfield
changeover, and the universal
joint stage handle which allows quick movement of the
stage by hand from a fixed position.
StableandReliable
Front and rear support of the
stage, a low profile design, and
a nosepiece focusing system,
ali make for a super stable,
extremely rugged instrument.
4
u
OChoiceof either binocular or trinocular
observation tube.
8Lowered stage (75mm/2.9 in.lower
than previous model) with large
70 x 50 mm (2.8x 2 in.) stroke
eRevolving nosepiece with vertical
movement ensuresgreater focusing
accuracy
8Brightfield/darkfield changeover levei.
The built-in interlocking aperture
diaphragm opens when seIta darkfield
method; returnsto lhe previous state
when switched to brightfield method
00ptical
path changeover levei
0Universal-joint stage handle for fixed
position stage adjustment
f)Stabilized external powersupply with
light intensitycontrol
0
Feather-touchergo-diallight intensity
contrai
0Conveniently placed coaxial coarse/
fine focusing knob
GReticle slot
4DDetachable
Photo/CCTV
sideport
-
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By removinglhe side parI, a C-mount \""IJ
CCTV cameracan be directly attached
via a C-mountadapter; no relay lens
required
f)Filter herdei
e Lamphouse (12V-1OOWhalogen
illuminator is pictured)
eCF objectives
~
This
is the most frequentlyused observation method and
uses differences in reflection to obtain the natural calor and
shape of a sample.
/'
.
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This observation method is significant for observing and
photomicrographing minute flaws, surface irregularities,
differences in levei, ar samples with low reflection raies, ali
difficultto observe under brightfield observation.
EBmirrorblock
~
This observation method can capture subtle irregularities
and flaws as interference colors and indicate them in threedimensional forms. Thanks to its ability to represent very
small tilt(differentialcoefficient) with sharp differential
,contrast, this observation method can detect minute
differences in height.
Used to analyze specific optical characteristics such as
isotropy and anisotropy, this observation method permits
observation with polarized contrast by way of inteference
colors. Ideal for observing crystal conditions and detecting
stress such as metal fatigue.
Thisobservationmethod detects substances on a specimen inthe form of fluorescent
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images and is effectivein identifyingthem.
Fluorescencefilter blocks
-----
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These updated objectives reduce
aberration and keep fiare down to a
minimum.
ListofObjectives
CFPlanEPI I
------
*1.5X
2.5X
0.045
5X
0.13
0.3
CF Plan EPI
I
I
10X
I
CFPlanEPI
ELWD
CFLCDPlan
CR(with
coverglass
correction
0.6-1.2mm)1
CF Plan EPI ELWD
OA6
50X
100X
0.8
0.95
20X
OA
50X
0.55
0.8
20.3
20X
50X
0.35
OA5
20.5
138
100X
0.73
50X
095
4.7
0.35
100X
150X
0.95
0.95
200X
0.95
CF PlanApo
BD
í:F
P1anEPISLWD
OA
0.55
100X
0.8
5X
0.13
0.3
OA6
0.8
0.9
10.0.
6.5
3.1
0.54
0.39
20X
OA
50X
0..55
0..8
11.0.
82
1DOX
5DX
1DDX
150X
2DDX
CFPlanBD
II
5X
10X
DIC
I
ELWD
DIC
CF
Plan
BD
I
0.2
0.2
20X
10X
0..9
0..9
10.1-10.5
Z7-8.1
1.1
2.0.
DA2
DA
0..9
0.9
0.29
0.3
0.13
10.0
6.5
2DX
50X
100X
0..3
OA6
0.8
0.9
20X
50X
100X
OA
0.55
0.8
CF Plan BD ELWD
0.32
50X
100X
1
11.0
8.7
2.0
0.21
20X
50X
ELWD
CFPlanBO
8.8
22.5
16.5
31
0.54
0.3
10X
I
CFPlanBD
20X
3.6
100X
CFPlanEPI
SLWD
CF PlanApo
EPI
0.075
3.1
0.54
0.39
11.0
8.2
2.0
Forfurtherinlormalion.
see"'OPrIPHOT
Senes"'
ar"'OPrIPHOT
100S"'
brochure.
"'Usea polarize
r andananalyzer.
Forstandard
field01view([N. 20).
CF Plan Apo EPI
CF Plan BD ELWD DIC
CFWN10XEPMPhotomask
CFUWL
CFUWL
CFWN
1DX
1DXM
I 8X
1DX
1DXM
1o.XEPM
12.5X
15X
CFNFilarMicrometer1o.X-A
25
25
20.
20.
20.
20.
16
14
14
x
x
o
o
o
o
o
o
Notes:. 1. CFWN 10X M and CFWN 10X EPM types come with a photomask.
2. CFN Filar Micrameter 10X-Acomes with a micrameter.
o
o
o
o
o
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"
o
o
o
Crosshalrsto
indicatelhe centerof
viewínganglefor
.
3 1/4 x 4 1/4 in. Polaroid
.
'
Reticlepositíonguideon
the primary image plane
~ "'""In
,ti
1_<_-
~
You have a choice of three revolving
nosepieces for your individual applications:
quintuple brightfield EPI type, quintuple
bright/darkfield type and quintuple universal
type. An objectíve lens adapter allows you to
use an EPI Plan objective wíth the bright/
darkfield or universal revolving nosepiece.
Fromleft to right:OuintuplebrightfieldEPItype,quintuplebrightfdarklieldtype,andquintupleuniversaltype.
Objectiveadaptar
Because the reticle is inserted at the primary image plane position, the micrometer maintains fine focus regardless of
the state of the sample surface being observed.
~
Grainreticle(Austenite/grid)
Grain Reticle (Austenite/Grid)
ASTM*-standardAustenitereticle with
grain sizing numbers ranging from 1
through 8 for measuring iron and
steel organizations or grids can be
imprinted along with specimen
images. The grid consists of 20 lines
0.5mm apart.
Micrometer(scalelar 20Xobjectives)
Micrometer Reticle
Scales corresponding to objectives with 5X to
100X magnificatíons are avaílable as options.
Scales can be changed according to the objectives in use, with the scale ínserted in the stand.
'ASTM:
The
American
Materiais
Austenite(grainsizingnumbers1 - 8)*
Grid(20 lines0.5mmapart)'
'In\ermediate
Society for Testing and
~
35mmdarkboxwith databack
Polaroid*pack1ilmholder(#405/ #550)
'Polaroid is a registered trademark 01Polaroid Corporation, Cambridge, Mass., U.SA
--
PoTaroid'sheetlilm holder(# 545i)
Snap-upcamerahood
magnification
O.8X
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Select from falir types of eyepiece
tubes availablefor the EPIPHOT200.
Binoculareyepiece
tube B2
Trinoculareyepiecetube F2
TrinoculareyepiecetubeT2
EyepieceTubes
Fieldnumber
30"
Tilt angle
Pupildistancerange
Lightdistributionfatia
(Observation:
photo)
Detachable
straighttube
~
53-75mm
100:0
100:0/14:86
Yes
Yes
Nikon's FX-IIISeriesphotomicrographic systemsemploy the swingout beam splittersystemwhich
directs 100% of the illuminationto
the film plane.Youhavea choice of
three models:the auto-exposure
U-III, H-IIIand the manual-exposure
poli!' The Dark Box FDX-35reads
DX coded 35mm filmo
.U-III: Top-endmodel with 0.1%
and 1% spot exposure
measurementand 35% integrated
averagemeasurement
.H-III: Auto-exposuremodel with
1% spot and 35% integrated
averagemeasurement
.P-III: Manualexposure model
UltrawidefieldeyepiecetubeUW2
--
4,;;,
/jjl!9n
.
For detailed information, see the FX,III brochure
from Nikon.
~
~
EPIPHOT200 with photomicrographic system
",,----
u
-----
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u
EPIPH
or 200
PolaroidFiimHolder
(# 405/# 545i/# 550)**
I
DataBack
ENG-Mount
TV
(112in. CCO)
PoiaroidCamBIa
Holder"
I
ENG-Mount
TV
(2/3 in. CCO)
C-MountTV
(2/3 in. CCO)'
oarkBOX~g]
I~Q.
~
35mmCamBIa
C-Mount
TV Adapter
w&1~
T2
UW2
AdapterA
Photomicrographic
System
FX-lIiSerias
1i ~LJ
ProjectionLenses
mi(SidePolI)
F2
~
[JJp-,
[QID
12V-50WHaiogenLamphouse
~
Lens
+
m
I
50W Lamphouse
Adapter
100W
Lamphouse
Adapter
12V-100W
HalogenLamphouse
Starter
HG-100W
I
MercuryLamp
SocketB 100W
EpiCollector
~
02SmmFilter
.IP , RectangularStage
I 1L~
{}
045mm
Fiiter
SWI
EPIOuintuple
Nosepiece
PlainStage
~
~
plEf CFNCFUWL
~OX, 10XM)
Fiiar
IL
Micrometer
Eyeplece
Adapter
lorUW~
Eyepiece
r:::.w
Tubes li:I
BOOuintuple UniversalQuintuple
Nosepiece
Nosepiece
~
~
Nomarski
Prisms
~
c::::P
m
I'B
I
XenonStarter
EOMirrorBlock
100W
~
~
p-LamPhouse
~
,Fiber
.
LlquidFiber
GUlde
fJ1
MetalHalide
Starter
I'B
Fluorescence
FilterBlocks
(V/B/G)
Cabia
100W Power Supply Unit
u
CFNFiiarMicrometer
10X-M
EyepieceLens
-[]-~
HMX-3
XenonLamp Lamphouse
HMX-3 Lamphouse
SocketS 100W
Adapter
I
Ãdaptêr4X
'"
*2: TypeFcanbeused
with F2oniy.
\J
Format
rrIfl-~rfl
CFWN
CFWN
(8X.1aX.12.5X.15X) 10XM
r--IQJ
e
I
Farge
0*1
ENG-Mount
TVAdapter
0.45XType
T/F*2
i~
I
I
.§
4 x 5 in.
CamBIaAdapter
GuideAd
apter
O
Polarizei
I
First-orderRedCompensator
~
CTIJ
MicrometerReticle
GrainReticle(Austenite/Grid)
Analyzer
'Polaroidis a registeredtrademark
01PolaroidCorporation,Cambridge,
Mass_,U.S.A.
"Not Nikonproducts;availableuponleques!.
11
Specifications
Oimensional
Boxtype
Fixedbinoculareyepiecetuba
Rotation01eyepiecereticleis
compensated
CFWN8X,10X,10XEPM,12.5X,
15X,CFNFilerMicrometer10X-A
Eyepieces
Lightdistribution
4-way(observation/sideparti
35mm/largeformal)
Obs.100,
Obs./sideport 20/80,
Obs./35mm20/80,
Obs./largeformal 20/80
0.8-2X zooming(stopswith a click
at1.0X, 1.25X,1.5X)
Intermediate
magnilication
Scaleimprinting
Position
Type
Epi-illuminator
Lightsource
4 typesdetachable:B2,F2,UW2,
T2 (seepaga9 for moredetails)
CFUWL10X,
10XM,CFWN8X,
10X,
10XEPM,
CFNFilerMicrometer
10X-A
0
2-way(observation/sideparI)
Obs.100,
Obs./sideport 20/80
(Straighttuba usablewith a
trinoculareyepiecetuba)
Insertingat primaryimageplane
Micrometerseara,Grainrefreie(AusteniterefreiesNo.1-8 andGrid)
Built-incenterablefieldandaperturediaphragms
12V-100Whalogen(precentered/standard),
12V-50Whalogen(op1ion),
100WHg(option),
100WXe (option),
~
150WMetalHalide(option)
Filter
12V-100Whalogenilluminator:three045mmfilters attachable(NCB11,
NO2/NO4,NO8,GIF),
12V-50Whalogenilluminator:two 025mmfilters attachable(NCB11,NO2,
NO4,Glf),
Mercury/xenonhighintensityilluminator:three045mmfilters attachable
(NCB11,NO2/NO4,NO8,GIF),
Built-inglare-protectionfritar (NO8)(worksduringchangeoverbetween
brightfieldanddarkfield)
Fielddiaphragm
Centeringcanbe provided(adjustsitselfduring brightfield/darkfield
changeover)
Aperturediaphragm Centeringcanbe provided
Focusingsystem
Nosepiecefocusing
Stoke
4mm (3mm upward,1mm downward)
Coarse
4mm/rotation
Fine
à.1mm/rotation
Minimumreading
1~mcoarsemetiDotorqueadjustable
Nosepiece
1) UniversalQuintupleNosepiece
2) BOQuintupleNosepiece
3) EpiQuintupleNosepiece
Objectives
Seepaga6 for details
Stage
Both-endsupported;detachable
Stageattachment
299mm(11.8in.)
I295mm(11.6in.)
Stageheight
1) Rectangularstagewith universaljoint andlow positionedcoaxialcontrai
knob,Cross-travelrange:70 x 50 mm (2.8x 2.0 in.)
2) praiastage(availableas option)
Photomicrography
Measuringarea
60% integratedaverage
(Photomicrographic
SystemFX-III
SPO
Lightdetectar
Seriasavailable
asoption)
Magnilication
2-5X (35mm),
8-20X (Iargeformal)
Function
Manualexposure;
Autobracketing;
AElock(memory
of exposure
time);
Review
function
Sideport
038mmstraightport + photoparI;accommodates
photomicrographic/CGTV
systems
361 x 736 x 436 mm
Dimensions(Wx Dx H) and 361x 763x 450 mm
weight(approx.)
(14.2x30.0x17.7in.);39kg(86Ibs.)
(14.2x29.0x17.2in.);31kg(68Ibs,)
Power supply unit
PSM-1120:100-120VAC,3A,50/60 Hz
PSM-2120:220-240VAC,2A,50/60Hz
Specifications
May 1997.
Oiagrams
Uni!: mm (inch)
'-'
ISO 9001 Certified
NIKON CORPORATlON
Instruments
Division
Vokohama
Plan!
and equipment are subject to change without any notice or obligation on the part of the manufacturer.
@1994/95/96/97/98 NIKON CORPORATION
NIKON INC.
SciencesandTechnologiesGroup
InstrumentsDivision
v
1300WaltWhitmanRoad,Melville,NY.11747-3064,U.S.A.
Te!: +1-516-547-8500 Te!efax: +1-516-547-0306
Iln:\olllollllW111õ11
http://www.nikonusa. comi!
Printed in Japan (9805-05)T
Code No.
2CEKXE5
This brochure is printed on recycled paper made Irem 40% used material.
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